Physics | Engineering internship: Multi-beam SEM performance optimization
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简介 在ASML Delft,我们正在开发下一代多束扫描电子显微镜(SEM)用于半导体晶圆检查。这个实习项目专注于提高半导体制造中使用的先进检查系统的成像性能。由于显微镜的视场大和焦深浅,晶圆表面的变化会影响图像质量和检查效率。在此实习期间,你将帮助开发更好的方法来理解……
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Introduction At ASML Delft, we are developing a next-generation multi-beam scanning electron microscope (SEM) for semiconductor wafer inspection. This internship focuses on improving the imaging performance of advanced inspection systems used in semiconductor manufacturing. Due to the microscope's large field of view and shallow depth of focus, wafer surface variations can affect image quality and inspection efficiency. During this internship, you will help develop methods to better understand …
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